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PVD - PHYSICAL VAPOR DEPOSITION

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Dual Magnetron sputtering


A custom made dual magnetron sputtering chamber located in the laboratory of functional coatings in the physics center at the University of Minho is configured in a unbalance closed field configurations with targets of 100mm × 200mm × 6 mm. 

The system is couple with two DC Power supply and one Pulsed DC power supply, rotational substrate holder with variable speed, pre-chamber, and flux controllers for four different types of reactive gases. The plasma process and coating deposition may be
controlled manually or by computer through a custom made software.
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