PVD - PHYSICAL VAPOR DEPOSITION
Dual Magnetron sputtering
A custom made dual magnetron sputtering chamber located in the laboratory of functional coatings in the physics center at the University of Minho is configured in a unbalance closed field configurations with targets of 100mm × 200mm × 6 mm.
The system is couple with two DC Power supply and one Pulsed DC power supply, rotational substrate holder with variable speed, pre-chamber, and flux controllers for four different types of reactive gases. The plasma process and coating deposition may be controlled manually or by computer through a custom made software.